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| 008 | 151028s2016 gw | s |||| 0|eng d | ||
| 020 | _a9783319203850 | ||
| 040 | _aES-MaUEC | ||
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_aTK7874 _b.Y834 2016 |
|
| 082 | 0 | 4 | _a621.3815 |
| 100 | 1 |
_aYu, Bei. _997058 _0Local |
|
| 245 | 1 | 0 |
_aDesign for Manufacturability with Advanced Lithography _cby Bei Yu, David Z Pan |
| 250 | _a1st ed. | ||
| 260 |
_aCham _bSpringer International Publishing _c2016 |
||
| 300 |
_a1 recurso en línea (XI, 164 p.) _b100 ilustraciones, 91 ilustraciones en color |
||
| 336 |
_aTexto (visual) _btxt _2rdacontent |
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| 337 |
_aelectrónico _bc _2rdamedia |
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| 338 |
_arecurso electrónico _bcr _2rdacarrier |
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| 505 | 0 | _aIntroduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-. | |
| 520 | _aThis book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography. | ||
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_aSpringerLink (Online service) _0Local _9106996 |
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_aElectrónica _0comprobar BNE19900963053 _2embne _9138690 |
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_aIngeniería _vCongresos y asambleas _0LocalX _2embne _9670301 |
| 700 | 1 |
_aPan, David Z. _997059 _0Local |
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_uhttps://go.openathens.net/redirector/universidadeuropea.es?url=https://link.springer.com/book/10.1007/978-3-319-20385-0 _zAcceso a este recurso digital (usuarios Universidad Europea de Madrid) |
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_a.b12939699 _b10-10-17 _c21-11-16 |
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