000			03307nam a22004695i 4500
999			_c386847 _d386847
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003			ES-MaUEC
005			20230129135706.0
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007			cr nn 008mamaa
008			220601s2020 sz | s |||| 0|eng d
020			_a9783031020353
024	7		_a10.1007/978-3-031-02035-3 _2doi
040			_aES-MaUEC _bspa _cES-MaUEC _dES-MaUEC
050		4	_aTS183 _b2020 EB
100	1		_aBaranov, Oleg O. _eautor _4aut _4http://id.loc.gov/vocabulary/relators/aut _9686289
245	1	0	_aAdvanced Concepts and Architectures for Plasma-Enabled Material Processing _cby Oleg O. Baranov, Igor Levchenko, Shuyan Xu, Kateryna Bazaka
250			_a1st edition 2020
264		1	_aCham _bSpringer International Publishing _c2020
300			_a1 recurso en línea (VIII, 82 páginas)
336			_atexto _btxt _2rdacontent
337			_aelectrónico _bc _2rdamedia
338			_arecurso electrónico _bcr _2rdacarrier
347			_aarchivo de texto _bPDF
490	0		_aSynthesis Lectures on Emerging Engineering Technologies _x2381-1439
505	0		_aIntroduction -- Technological Plasmas and Typical Schematics -- Plasma Parameters with Respect to Material Processing -- How to Control Plasma Parameters -- Material Processing -- Perspectives and Trends -- Conclusion -- Authors' Biographies.
520			_aPlasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
988			_aSynthesis Collection of Technology_2020
650		7	_2embne _9672140 _aPlasma (Gases ionizados) _xAplicaciones industriales
650		7	_2embne _9162199 _aNanoestructuras
650		7	_2embne _9668239 _aProcesos de fabricación _xInnovaciones tecnológicas
700	1		_aLevchenko, Igor _eautor _4aut _4http://id.loc.gov/vocabulary/relators/aut _9686290
700	1		_aXu, Shuyan _eautor _4aut _4http://id.loc.gov/vocabulary/relators/aut _9686291
700	1		_aBazaka, Kateryna _eautor _4aut _4http://id.loc.gov/vocabulary/relators/aut _9686292
776	0	8	_iPrinted edition: _z9783031001413
776	0	8	_iPrinted edition: _z9783031009075
776	0	8	_iPrinted edition: _z9783031031632
856	4	0	_uhttps://go.openathens.net/redirector/universidadeuropea.es?url=https://doi.org/10.1007/978-3-031-02035-3 _zAcceso a este recurso digital (usuarios Universidad Europea de Madrid)
942			_2lcc _cLE
998			_b01/2023 _dz _esc _zSI